[19p-E14-1~21] 13.3 Si Process・Interconnect・MEMS・Integration

[19p-E14-11] Silicon Thermal Oxidation Process using Minimal Focused Light Heating Furnace

^○Noriko Miura^1,2, Takeshi Aizawa^1,2, Takanori Mikahara², Takeshi Yamada^1,2, Yasuhiro Onishi^1,2, Yuuki Ishida^2,3, Shinichi Ikeda^2,3, Katsuhiko Nakato², Sommawan Khumpuang^2,3, Shiro Hara^2,3 (YONEKURA MFG. Co.,LTD¹, MINIMAL², AIST³)

Keywords:minimal fab,加熱炉,熱酸化膜