[19p-E14-1~21] 13.3 Si Process・Interconnect・MEMS・Integration

[19p-E14-14] Minimal System of Micro-Plasma Etcher Equipment(II)

^○Hiroyuki Tanaka¹, Shizuka Nakano^1,2, Yoshiki Shimizu^1,2, Hisato Ogiso^1,2, Shinji Futagawa³, Hideaki Yoshioka³, Takahiro Fukuda³, Yoshinori Uchiyama³, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (MINIMAL¹, AIST², Design Network³)

Keywords:プラズマ,エッチング,ミニマル