[19p-E14-1~21] 13.3 Si Process・Interconnect・MEMS・Integration

[19p-E14-17] Silicon Film Growth by the Minimal CVD Process

^○Shinichi Ikeda^1,2, Yuki Ishida^1,2, Takanori Mikahara¹, Katsuhiko Nakato¹, Hitoshi Habuka³, Khumpuang Sommawan^1,2, Shiro Hara^1,2 (MINIMAL¹, AIST², Yokohama National Univ.³)

Keywords:ミニマル,多結晶シリコン