[19p-E14-1~21] 13.3 Si Process・Interconnect・MEMS・Integration

[19p-E14-8] Exposure properties of a minimal Mask-aligner

^○Norio Umeyama¹, Yoshiki Inuzuka^1,2, Sommawan Khumpuang^1,3, Shiro Hara^1,3 (MINIMAL¹, Sanmei², AIST³)

Keywords:アライナー,ミニマルファブ