[19p-E14-1~21] 13.3 Si Process・Interconnect・MEMS・Integration

[19p-E14-9] Superimposing accuracy in Minimal Mask-less Exposure System

^○Yuuji Kitayama¹, Yousuke Tanaka^1,2, Ryouichi Irita^1,2, Kenji Miyake^1,2, Sommawan Khumpuang^1,3, Shiro Hara^1,3 (MINIMAL¹, PMT², AIST³)

Keywords:ミニマルファブ