The 61st JSAP Spring Meeting, 2014

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Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

[19p-F6-1~18] 8.4 Plasma etching

Wed. Mar 19, 2014 2:00 PM - 7:00 PM F6 (F306)

2:00 PM - 2:15 PM

[19p-F6-1] Interface trap generation at SiO2/Si structure by CHxFy plasma etching

○Takushi Shigetoshi1, Masanaga Fukasawa1, Kazunori Nagahata1, Tetsuya Tatsumi1 (Sony Corp.1)

Keywords:エッチング,ダメージ,プラズマ