The 61st JSAP Spring Meeting, 2014

Presentation information

Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

[19p-F6-1~18] 8.4 Plasma etching

Wed. Mar 19, 2014 2:00 PM - 7:00 PM F6 (F306)

6:15 PM - 6:30 PM

[19p-F6-16] Activation energy measurement of chlorine neutral beam etching of GaAs

Thomas Cedric1, Yosuke Tamura1, Akio Higo2, Takeru Okada1, Seiji Samukawa1,2 (IFS, Tohoku Univ.1, WPI-AIMR, Tohoku Univ.2)

Keywords:GaAs,neutral beam