The 61st JSAP Spring Meeting, 2014

Presentation information

Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

[19p-F6-1~18] 8.4 Plasma etching

Wed. Mar 19, 2014 2:00 PM - 7:00 PM F6 (F306)

6:30 PM - 6:45 PM

[19p-F6-17] Super excited states and ionization of CFx compounds

Toshio Hayashi1, Kenji Ishikawa1, Makoto Sekine1, Masaru Hori1 (Nagoya University1)

Keywords:CFx ラジカル,超励起状態,イオン化閾値