Activation energy measurement of chlorine neutral beam etching of GaAs

Presentation information

Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

Wed. Mar 19, 2014 2:00 PM - 7:00 PM F6 (F306)

6:15 PM - 6:30 PM

^○Thomas Cedric¹, Yosuke Tamura¹, Akio Higo², Takeru Okada¹, Seiji Samukawa^1,2 (IFS, Tohoku Univ.¹, WPI-AIMR, Tohoku Univ.²)

Keywords:GaAs,neutral beam