[19p-F6-1~18] 8.4 Plasma etching

[19p-F6-17] Super excited states and ionization of CFx compounds

^○Toshio Hayashi¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (Nagoya University¹)

Keywords:CFx ラジカル,超励起状態,イオン化閾値