[19p-F6-1~18] 8.4 Plasma etching

[19p-F6-18] Study of residual moisture suppression in the compound semiconductor etching

^○Yukihiro Tsuji¹, Kenichi Machinaga¹, Hiroshi Inada¹, Tsukuru Katsuyama¹ (Sumitomo Electric Industries, Ltd.¹)

Keywords:化合物半導体,ドライエッチング,半導体レーザ