Effects of metal carbonyls formation during ferromagnetic metal etching processes

Presentation information

Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

Wed. Mar 19, 2014 2:00 PM - 7:00 PM F6 (F306)

2:30 PM - 2:45 PM

^○Kohei Mizotani¹, Keita Miyake¹, Michiro Isobe¹, Kazuhiro Karahashi¹, Satoshi Hamaguchi¹ (Osaka Univ.¹)

Keywords:半導体,強磁性体,カルボニル