[19p-F6-1~18] 8.4 Plasma etching

△ [19p-F6-3] Effects of metal carbonyls formation during ferromagnetic metal etching processes

^○Kohei Mizotani¹, Keita Miyake¹, Michiro Isobe¹, Kazuhiro Karahashi¹, Satoshi Hamaguchi¹ (Osaka Univ.¹)

Keywords:半導体,強磁性体,カルボニル