[19p-F6-1~18] 8.4 Plasma etching

△ [19p-F6-4] Etching reactions for transparent conducting films by CHx ions

^○Hu Li¹, Yu Muraki¹, Kazuhiro Karahashi¹, Masanaga Fukasawa², Kazunori Nagahata², Tetsuya Tatsumi², Satoshi Hamaguchi¹ (Osaka Univ¹, Sony corporation²)

Keywords:透明電極材料,エッチング