[19p-PA2-1~9] 1.3 Novel Technologies and Frontier Engineering Science

[19p-PA2-8] Influence of Photoresist Material on Photoresist Removal Process Characteristics using Microwave Excited Bubble Plasma in Water

^○Tatsuo Ishijima¹, Kouhei Nosaka¹, Yasunori Tanaka¹, Yoshihiko Uesugi¹, Yousuke Gotou², Hideo Horibe³ (Kanazawa Univ.¹, Kanazawa Inst. Tech.², Osaka City Univ.³)

Keywords:レジスト,マイクロ波,プラズマ