[19p-PG2-1~12] 13.2 Insulator technology

[19p-PG2-10] Formation of GeO₂ Thin Films on p-Ge Substrate by Reactive RF Sputtering

^○Byeonghak Yoo¹, Keita Seki², Taito Kikuchi¹, Kosei Yanachi¹, Hiroki Ishizaki¹, Yohei Otani¹, Tetsuya Sato², Yukio Fukuda¹ (Tokyo University of Science, Suwa¹, University of Yamanashi²)

Keywords:スパッター