The 61st JSAP Spring Meeting, 2014

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13. Semiconductors A (Silicon) » 13.5 Si-English Session

[20a-F10-1~13] 13.5 Si-English Session

Thu. Mar 20, 2014 9:00 AM - 12:30 PM F10 (F406)

12:15 PM - 12:30 PM

[20a-F10-13] Mobility Enhancement in TiO2-Channel TFTs by Decreasing In-Gap States in The Film and Mitigating Grain Boundary Adsorption

○Takeaki Yajima1, Go Oike1, Tomonori Nishimura1, Kosuke Nagashio1, Akira Toriumi1 (Univ. of Tokyo1)

Keywords:電界効果移動度,ギャップ内準位