Electrical activation and crystallinity recovery of P-implanted Ge

Presentation information

Oral presentation

13. Semiconductors A (Silicon) » 13.5 Si-English Session

Thu. Mar 20, 2014 9:00 AM - 12:30 PM F10 (F406)

10:00 AM - 10:15 AM

^○Toshimitsu Nakamura^1,2, Tomonori Nishimura^1,2, Kosuke Nagashio^1,2, Akira Toriumi^1,2 (Univ. of Tokyo¹, JST-CREST²)

Keywords:ゲルマニウム,implantation,phosphorus