The 61st JSAP Spring Meeting, 2014

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13. Semiconductors A (Silicon) » 13.3 Si Process・Interconnect・MEMS・Integration

[20p-E14-1~4] 13.3 Si Process・Interconnect・MEMS・Integration

Thu. Mar 20, 2014 1:15 PM - 2:15 PM E14 (E302)

2:00 PM - 2:15 PM

[20p-E14-4] Fabrication of Co thin film using a CVD method.

kazuhiro harada1, arito ogawa1, ○hiroshi ashihara1, jiro yugami1 (Hitachi Kokusai Electric Inc.1)

Keywords:Co,CVD