[20p-E2-1~6] 17.1 Growth technology

▼ [20p-E2-2] Conductive DLC Film Deposition by Low Temperature Neutral Beam Enhanced Chemical Vapor Deposition

^○Xijiang Chang¹, Yoshiyuki Kikuchi^1,2, Masanori Nakano³, Kumi Inoue^3,4, Tomokazu Matsue^3,4,5, Toshihisa Nozawa², Seiji Samukawa^1,5 (IFS, Tohoku Univ.¹, Tokyo Electron Limited², Graduate School of Environmental Studies, Tohoku Univ.³, microSIC, Tohoku Univ.⁴, WPI-AIMR, Tohoku Univ.⁵)

Keywords:プラズマCVD,バイオLSI,導電性カーボン膜