Oral presentation

[13p-1F-1~2] 8.8 プラズマエレクトロニクス分科内招待講演

Sun. Sep 13, 2015 1:00 PM - 2:30 PM 1F (Reception Hall 1)

座長:杤久保文嘉(首都大)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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1:00 PM - 1:45 PM

▲ [13p-1F-1] [Invited lecture of overseas researcher] Evolution of Electron Density and Temperature in the Afterglow of Low Pressure Argon Discharges

Fei-Xiang Liu¹, Zhi-Wen Cheng¹, 〇Yi-Kang Pu¹ (1.Tsinghua Univ.)

1:45 PM - 2:30 PM

▲ [13p-1F-2] [Invited lecture of overseas researcher] Integrated Approaches for Surface Chemistry Control in Plasma Processing

〇Peter L. G. Ventzek¹, H. Ueda², Y. Kobayashi², T. Iwao², K. Ishibashi², A. Ranjan³, M. Wang³, A. Suzuki², H. Higuchi², B. Lane¹, R. Upadhyay⁴, G.S. Hwang⁵, L. Raja⁵, A. Koshiishi⁶ (1.Tokyo Electron America Inc., 2.Tokyo Electron Ltd., 3.Tokyo Electron Tech. Center America, 4.Esgee Tech., 5.Univ. of Texas at Austin, 6.Tokyo Electron Miyagi Ltd.)

Oral presentation

[14a-1F-3~4] 8.8 プラズマエレクトロニクス分科内招待講演

Mon. Sep 14, 2015 10:30 AM - 11:30 AM 1F (Reception Hall 1)

座長:杤久保文嘉(首都大)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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10:30 AM - 11:00 AM

[14a-1F-3] [INVITED　TALK] Non-thermal Plasma for control of PM2.5 and Gaseous Pollutants

〇Akira Mizuno¹ (1.TUT)

11:00 AM - 11:30 AM

[14a-1F-4] [INVITED　TALK] For the quantitative control of plasma processes

〇Tetsuya Tatsumi¹ (1.DMRG, Sony Corp.)

Sessions

8 Plasma Electronics » 8.8 プラズマエレクトロニクス分科内招待講演

[13p-1F-1~2] 8.8 プラズマエレクトロニクス分科内招待講演

▲ [13p-1F-1] [Invited lecture of overseas researcher] Evolution of Electron Density and Temperature in the Afterglow of Low Pressure Argon Discharges

▲ [13p-1F-2] [Invited lecture of overseas researcher] Integrated Approaches for Surface Chemistry Control in Plasma Processing

[14a-1F-3~4] 8.8 プラズマエレクトロニクス分科内招待講演

[14a-1F-3] [INVITED　TALK] Non-thermal Plasma for control of PM2.5 and Gaseous Pollutants

[14a-1F-4] [INVITED　TALK] For the quantitative control of plasma processes

Authentication

Sessions

8 Plasma Electronics » 8.8 プラズマエレクトロニクス分科内招待講演

[13p-1F-1~2] 8.8 プラズマエレクトロニクス分科内招待講演

▲ [13p-1F-1] [Invited lecture of overseas researcher] Evolution of Electron Density and Temperature in the Afterglow of Low Pressure Argon Discharges

▲ [13p-1F-2] [Invited lecture of overseas researcher] Integrated Approaches for Surface Chemistry Control in Plasma Processing

[14a-1F-3~4] 8.8 プラズマエレクトロニクス分科内招待講演

[14a-1F-3] [INVITED TALK] Non-thermal Plasma for control of PM2.5 and Gaseous Pollutants

[14a-1F-4] [INVITED TALK] For the quantitative control of plasma processes

Authentication

[14a-1F-3] [INVITED　TALK] Non-thermal Plasma for control of PM2.5 and Gaseous Pollutants

[14a-1F-4] [INVITED　TALK] For the quantitative control of plasma processes