9:15 AM - 9:30 AM
[13a-4C-2] Electrical Characteristics of Plasma ALD SiO2 Films with Nitrogen Incorporation
Keywords:silicon oxynitride
Oral presentation
13 Semiconductors » 13.3 Insulator technology
Sun. Sep 13, 2015 9:00 AM - 12:15 PM 4C (432)
座長:渡邉 孝信(早大),右田 真司(産総研)
9:15 AM - 9:30 AM
Keywords:silicon oxynitride