10:00 AM - 10:15 AM
[13a-4C-5] Substrate temperature dependence of ALD alumina film using oxygen plasma
Keywords:dipole,alumina
Oral presentation
13 Semiconductors » 13.3 Insulator technology
Sun. Sep 13, 2015 9:00 AM - 12:15 PM 4C (432)
座長:渡邉 孝信(早大),右田 真司(産総研)
10:00 AM - 10:15 AM
Keywords:dipole,alumina