The 76th JSAP Autumn Meeting, 2015

Presentation information

Oral presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

[13p-1D-1~26] 15.4 III-V-group nitride crystals

Sun. Sep 13, 2015 1:15 PM - 8:15 PM 1D (141+142)

座長:斉藤 真(三菱化学),岡田 成仁(山口大),岩谷 素顕(名城大)

2:00 PM - 2:15 PM

[13p-1D-4] Evaluation of Crystal Defects in GaN by X-ray topography

〇Katsuhiko Nakai1, Tetsuya Nagai1, Kengo Noami1, Masayuki Sasaki1, Toshiro Futagi1 (1.NSST)

Keywords:X-ray topography,GaN,Dislocation

Crystal defects in GaN crystals were evaluated by X-ray topography, selective etching and TEM. We found that X-ray topography is available to evaluate dislocations of a GaN crystal with the dislocation density in the order of 1E4/cm2 because X-ray anomalous transmission (the Borrmann effect) becomes effective as dislocation density decreases.