The 76th JSAP Autumn Meeting, 2015

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[14p-2H-1~15] 6.3 Oxide electronics

Mon. Sep 14, 2015 1:45 PM - 5:45 PM 2H (222)

座長:吉松 公平(東工大),打田 正輝(東大)

5:00 PM - 5:15 PM

[14p-2H-13] Time Response of VO2 Channel Transistors to Gate Voltage Application

〇Takeaki Yajima1,2, Tomonori Nishimura1,2, Akira Toriumi1,2 (1.The Univ. of Tokyo, 2.JST-CREST)

Keywords:Mott transition,Mott transistor

Time response of VO2 channel transistors to gate voltage application was studied in detail. The response time of the VO2 metal-insulator transition was orders of magnitude smaller than that of light-induced metal-insulator transition, which has a similar mechanism of transition. This descrepancy was attributed to the mechanism of carrier accumulation in the transistor channel.