The 76th JSAP Autumn Meeting, 2015

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[14p-2H-1~15] 6.3 Oxide electronics

Mon. Sep 14, 2015 1:45 PM - 5:45 PM 2H (222)

座長:吉松 公平(東工大),打田 正輝(東大)

4:45 PM - 5:00 PM

[14p-2H-12] Electric-field induced transport modulation in VO2 FETs with organic parylene-C/high-k oxide hybrid gate dielectric

〇TINGTING WEI1,2, Teruo Kanki1, Kohei Fujiwara3, Hidekazu Tanaka1 (1.Osaka Univ., 2.Kunming Sci Tech Univ., 3.Tohoku Univ.)

Keywords:Field-effect transistor

Recently, the electrostatic modulation in correlated oxides system utilizing field-effect transistor (FET) has been widespread applied as an effective tool to probe underlying physics, especially in the prototypical correlated oxide VO2, which undergoes dramatic resistance change from the insulating monoclinic phase to the metallic rutile phase at TMI=340K. Since the gate insulator of FETs is the key component for producing huge carrier modulation, many efforts have been focused on it. However, conventional dielectrics were restricted due to the defects induced to channel during theirs deposition. In addition, for a novel ionic liquid gating, whether the chemical reaction participates in the resistance change or not is still under debate. In this study, we demonstrated the resistance modulation of VO2 thin films triggered by field effect utilizing hybrid gate insulator consisted of organic polymer insulator parylene-C and high-k material Ta2O5, in which parylene-C was expected as effective insulating layer to reduce interface defects.