The 76th JSAP Autumn Meeting, 2015

Presentation information

Oral presentation

15 Crystal Engineering » 15.7 Fundamentals of epitaxy

[14p-2W-11~16] 15.7 Fundamentals of epitaxy

Mon. Sep 14, 2015 4:45 PM - 6:15 PM 2W (234-2(North))

座長:高橋 正光(原子力研究)

5:15 PM - 5:30 PM

[14p-2W-13] A conjecture for the growth processes on InAs(001)-(4×3) wetting layer surface

〇Tomonori Ito1, Toru Akiyama1, Kohji Nakamura1 (1.Mie Univ.)

Keywords:InAs wetting layer surface,growth processes

Hetero epitaxial growth processes of InAs on GaAs(001) are discussed on the basis of the results obtained by ab initio-based approach. It is found that the growth processes are mainly dominated by strain relaxation to stabilize the InAs(001) wetting layer surfaces instead of the electron counting rule.