[14p-4C-1~6] Dielectric Thin Film Technology Beyond Borders: From Si to Non-Si

[14p-4C-1] What were the key points in high-k gate stacks?

〇Kenji Shiraishi¹ (1.Nagoya Univ.)

Keywords:High-k Gate Dielectrics,Fermi Level Pinning,Control of Threshold Voltage

We disucss the key physical phenomena in the development of high-k gate dielectrics, and consider what has been done in mass production of high-k LSIs.