The 76th JSAP Autumn Meeting, 2015

Presentation information

Symposium

Symposium » Dielectric Thin Film Technology Beyond Borders: From Si to Non-Si

[14p-4C-1~6] Dielectric Thin Film Technology Beyond Borders: From Si to Non-Si

Mon. Sep 14, 2015 1:30 PM - 4:45 PM 4C (432)

座長:小山 正人(東芝),渡邉 孝信(早大)

1:30 PM - 2:00 PM

[14p-4C-1] What were the key points in high-k gate stacks?

〇Kenji Shiraishi1 (1.Nagoya Univ.)

Keywords:High-k Gate Dielectrics,Fermi Level Pinning,Control of Threshold Voltage

We disucss the key physical phenomena in the development of high-k gate dielectrics, and consider what has been done in mass production of high-k LSIs.