The 76th JSAP Autumn Meeting, 2015

Presentation information

Oral presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

[15a-1D-1~11] 15.4 III-V-group nitride crystals

Tue. Sep 15, 2015 8:45 AM - 11:45 AM 1D (141+142)

座長:小林 康之(弘前大),太田 実雄(東大)

8:45 AM - 9:00 AM

[15a-1D-1] Growth evolution of γ’-Fe4N films grown on GaN(0001) and their interfacial structure

〇(M1)Masamitsu Kimura1, Shigehiko Hasegawa1 (1.ISIR)

Keywords:semiconductor,iron nitride,gallium nitride

For realization of semiconductor spintronic devices, it is necessary to achieve spin injection into semiconductors with high efficiency. γ’-Fe4N is one of the most attractive electrode materials for spin injection because it has a half-metalic band structure. The spin injection/detection efficiency depends on structures of electrode/semiconductor interfaces. In this presentation, we will report on Fe nitride epitaxial growth on GaN(0001) by plasma-assisted molecular beam epitaxy (PA-MBE), especially focusing on structures of γ’-Fe4N/GaN interfaces.