[15a-4E-1~7] 7.1 X-ray technologies

[15a-4E-2] X-ray reflecting demonstration in 12 inch Si wafer optics produced by MEMS Tech.

〇Masaki NUMAZAWA¹, Yuichiro Ezoe¹, Kumi Ishikawa², Tomohiro Ogawa¹, Mayu Sato¹, Kasumi Nakamura¹, Takaya Ohashi¹, Kazuhisa Mitsuda³, Ryutaro Maeda⁴, Hiroshi Hiroshima⁴, Yuichi Kurashima⁴, Daiji Noda⁵ (1.TMU, 2.RIKEN, 3.JAXA / ISAS, 4.AIST, 5.MMC)

Keywords:X-ray optics,12 inch Si wafer,MEMS

We are using micromachine technology to form innumerable microscopic and perpendicular curved holes in the Si wafer, and developing the novel ultra-lightweight X-ray optics with utilizing the side wall of the holes as a reflecting mirror. In this talk, we are going to report the result of the world's first X-ray reflection demonstrated in the 12 inch Si wafer optics produced by using the world's highest performance etching apparatus belonging to the AIST.