[16a-1B-1~12] 21.1 Joint Session K

[16a-1B-12] Plasmonic technology in wide-gap oxide semiconductors:
Fabricartions of reflection-type thermal-shielding sheets with visible/electromagnetic transmissions

〇Hiroaki Matsui¹, Shinya Furuta², Takayuki Hasebe³, Noriyuki Hasuike⁴, Hitoshi Tabata¹ (1.The Univ. of Tokyo, 2.Tomoe Works, 3.Custum Central Lab., 4.Kyoto Inst. of Tech.)

Keywords:Wide-gap oxide semiconductor,Surface plasmons,Nanomaterials

Smart window applications based on functionalities of thermal-shielding with a reflection-type are important to realize comfortable urban environment. In this presentation, we introduce plasmonic technology based on oxide semiconductors towards reflection thermal-shielding sheets with visible/electromagnetic transmissions. Near-field interactions at gap space between nanoparticles produce selective reflection properties in the near- and mid-infrared region. This study provides new insight of optical manipulation in oxide semiconductors.