[16a-4E-9~12] 7.3 Micro/Nano patterning and fabrication

[16a-4E-10] Electron beam lithography using NEB-22 for 50 nm-line and space pattern fabrication

〇Makoto Okada¹, Shinji Matsui¹ (1.LASTI, Univ. of Hyogo)

Keywords:electron beam lithography,negative tone resist

We carried out electron beam lithography using NEB-22 for 50 nm-line and space pattern fabrication. The 40 nm-line and 70 nm-space pattern was clearly fabricated.