Development of pulsed CO2 Laser System for Extreme Ultraviolet Lithography

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.1 X-ray technologies

Wed. Sep 16, 2015 9:00 AM - 11:00 AM 4E (437)

座長:村松康司(兵庫県立大)

10:00 AM - 10:15 AM

〇Takahiro Tatsumi¹, Krzysztof Nowak¹, Takashi Suganuma¹, Yoshiaki Kurosawa¹, Hiroaki Hamano¹, Yasufumi Kawasuji¹ (1.GIGAPHOTON INC.)

Keywords:EUV sources