[16p-2Q-1~13] 8.3 deposition of thin film and surface treatment

[16p-2Q-5] DLC On-site Deposition by Atmospheric-Pressure μPlasma

〇Hiroyuki Yoshiki¹, Ryo Yagyu¹ (1.Tsuruoka National College of Tech.)

Keywords:diamond-like carbon film,atmospheric-pressure microplasma,RF plasma

Process conditions of the on-site chemical vapor deposition of DLC films on Al and Si substrate by an atmospheric-pressure non-equilibrium plasma (APP) flow with a gas mixture of Ar and CH₄ are studied. APP flow is generated by RF (13.56MHz) excitation using a surgical needle electrode. SEM imagies, FT-IR and Raman spectroscopy revealed that the deposited films are DLC with containing a lot of H atoms. Furthermore, the adhesion to a substrate and a film density were insufficient for the practical use.