[16p-2Q-1~13] 8.3 deposition of thin film and surface treatment

[16p-2Q-7] a-SiN thin films prepared by the RF sputtering system assisted by inductively coupled plasma

〇Yuki Ishii¹, Tetsuya Kaneko¹, Kunio Okimura¹, Haruo Shindo¹, Masao Isomura¹ (1.Tokai Univ.)

Keywords:ICP,sputtering,a-SiN