The 62nd JSAP Spring Meeting, 2015

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15 Crystal Engineering » 15.4 III-V-group nitride crystals

[11a-B1-1~12] 15.4 III-V-group nitride crystals

Wed. Mar 11, 2015 8:30 AM - 11:45 AM B1 (6B-101)

11:15 AM - 11:30 AM

[11a-B1-11] Influence of Sputtering Power on Crystalline Quality and Surface Characteristics of AlN Films Deposited by Pulsed DC Reactive Sputtering

Hiroto Takeuchi1, 〇Makoto Ohtsuka1, Hiroyuki Fukuyama1 (1.IMRAM, Tohoku Univ.)

Keywords:aluminium nitride,pulsed DC reactive sputtering,crystalline quality