[11p-B2-1~11] 7.3 Micro/Nano patterning and fabrication

[11p-B2-5] Dependence of demolding force on sidewall slope angle of mold pattern in nanoimprint I

Kimiaki Uemura¹, Kazuo Fujii¹, Marcin Michalowski², 〇(M1C)Takamitsu Tochino¹, Naoto Nakamura¹, Hiroaki Kawata¹, Zygmunt Rymuza², Yoshihiko Hirai¹ (1.Osaka Pref. Univ., 2.Warsaw Univ. of Technology)

Keywords:thermal nanoimprint,UV nanoimprint,mold mask