[11p-B2-1~11] 7.3 Micro/Nano patterning and fabrication

△ [11p-B2-6] Dependence of release force on sidewall slope angle of mold pattern in nanoimprint II

〇(M1C)Takamitsu Tochino¹, Kazuo Fujii¹, Marcin Michalowski², Kimiaki Uemura¹, Hiroaki Kawata¹, Zygmunt Rymuza², Yoshihiko Hirai¹ (1.Osaka Pref. Univ., 2.Warsaw Univ. of Technology)

Keywords:thermal nanoimprint,UV nanoimprint,mold mask