The 62nd JSAP Spring Meeting, 2015

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Symposium » State of the art technology in electron and focused-ion-beam apparatuses

[11p-B3-1~9] State of the art technology in electron and focused-ion-beam apparatuses

Wed. Mar 11, 2015 1:15 PM - 5:15 PM B3 (6B-103)

3:00 PM - 3:30 PM

[11p-B3-5] State-of-the-Art Technology of Electron Beam Direct Writing

〇Hiroshi Ozawa1, Yasuhisa Kuwano1, Hiromichi Hoshi1, Tadashi Komagata1 (1.JEOL Ltd.)

Keywords:EB lithography