The 62nd JSAP Spring Meeting, 2015

Presentation information

Poster presentation

8 Plasma Electronics » 8.3 deposition of thin film and surface treatment

[12p-P10-1~8] 8.3 deposition of thin film and surface treatment

Thu. Mar 12, 2015 4:00 PM - 6:00 PM P10 (Gymnasium)

4:00 PM - 6:00 PM

[12p-P10-2] Production and evaluation of RF magnetized plasma for target uniform utilization

〇Yasunori Ohtsu1, Shohei Tsuruta1, Tsubasa Ide1, Tabaru Tatsuo2, Morito Akiyama2 (1.Saga Uiniv., 2.AIST Kyushu)

Keywords:Sputtering source,Target uniform utilization,TCO and copper films