[12p-P10-1~8] 8.3 deposition of thin film and surface treatment

[12p-P10-2] Production and evaluation of RF magnetized plasma for target uniform utilization

〇Yasunori Ohtsu¹, Shohei Tsuruta¹, Tsubasa Ide¹, Tabaru Tatsuo², Morito Akiyama² (1.Saga Uiniv., 2.AIST Kyushu)

Keywords:Sputtering source,Target uniform utilization,TCO and copper films