[12p-P16-1~19] 15.4 III-V-group nitride crystals

▼ [12p-P16-5] Low-Temperature Growth of InN Films on Si(111) Substrates by Radical-Enhanced Metal-Organic Chemical Vapor Deposition

〇(PC)Yi Lu¹, Osamu Oda¹, Kazuki Iwamoto¹, Hiroki Kondo¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (1.Nagoya University)

Keywords:InN,low-temperature growth,REMOCVD