[14a-A24-1~12] 13.3 絶縁膜技術

▲ [14a-A24-11] Reliability-aware Germanium Gate Stack Formation by GeO₂ Network Modification

〇Cimang Lu^{1, 2}, Choong Hyun Lee^{1, 2}, Tomonori Nishimura^{1, 2}, Kosuke Nagashio^{1, 2}, Akira Toriumi^{1, 2} (1.The Univ. of Tokyo, 2.JST-CREST)

キーワード：Germanium,Reliability