The 62nd JSAP Spring Meeting, 2015

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Oral presentation

13 Semiconductors » 13.3 Insulator technology

[14a-A24-1~12] 13.3 Insulator technology

Sat. Mar 14, 2015 9:00 AM - 12:15 PM A24 (6A-217)

10:15 AM - 10:30 AM

[14a-A24-6] Control of fixed oxide charge density by ALD and ECR plasma oxidation

〇Yuta Nagatomi1, Yuichi Nagaoka1, Shintaro Tanaka1, Keisuke Yamamoto2, Dong Wang1, Hiroshi Nakashima2 (1.I-EggS, Kyushu Univ., 2.KASTEC)

Keywords:ALD,ECR plasma oxidation,fixed oxide charge