[14a-A27-1~15] 8.4 Plasma etching

[14a-A27-11] A Model for enhancement of plasma-induced radiation damage to low-k dielectrics with Cu lines

〇Taro Ikeda¹, Koji Eriguchi², Akira Tanihara¹, Nobuhiko Yamamoto¹, Shigeru Kasai¹, Kouichi Ono² (1.Tokyo Electron Yamanashi Ltd., 2.Kyoto Univ.)

Keywords:plasma-induced radiation damage,low-k damage,near-field