The 62nd JSAP Spring Meeting, 2015

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Oral presentation

8 Plasma Electronics » 8.4 Plasma etching

[14a-A27-1~15] 8.4 Plasma etching

Sat. Mar 14, 2015 9:00 AM - 1:00 PM A27 (6A-202)

12:15 PM - 12:30 PM

[14a-A27-13] Etching Characteristic improvement by control technique of ion energy distribution on wafer

〇Tooru Aramaki1, Michikazu Morimoto1, Norihiko Ikeda1 (1.Hitach High-Tech)

Keywords:Etching