12:30 PM - 12:45 PM
△ [14a-A27-14] Emission intensity of fluorine radical in TSV plasma etching reactor for MinimaiFab
Keywords:MinimalFab,plasma etching,semiconductor
Oral presentation
8 Plasma Electronics » 8.4 Plasma etching
Sat. Mar 14, 2015 9:00 AM - 1:00 PM A27 (6A-202)
12:30 PM - 12:45 PM
Keywords:MinimalFab,plasma etching,semiconductor