[14a-A27-1~15] 8.4 Plasma etching

△ [14a-A27-15] Instantaneous generation of many flaked particles in mass-production plasma etching process

〇Yuji Kasashima¹, Taisei Motomura¹, Fumihiko Uesugi¹ (1.AIST)

Keywords:flaked particle,electric field stress,impulsive force