Kazuki Nakamura

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Speaker, Author, Co-Author

Wed. Sep 14, 2016 9:00 AM - 11:45 AM A26 (203-204)

Oral presentation
| 6 Thin Films and Surfaces
| 6.2 Carbon-based thin films

[14a-A26-1~10] 6.2 Carbon-based thin films

11:30 AM - 11:45 AM

[14a-A26-10] Effects of Si- and N-Incorporation on the Properties of DLC Films by Plasma-Enhanced Chemical Vapor Deposition Using H₂ as a Dilution Gas

〇Kazuki Nakamura¹, Ohashi Haruka¹, Yokoyama Tai², Tajima Keiichiro², Endoh Norihumi², Suemitsu Maki², Enta Yoshiharu¹, Nakazawa Hideki¹ (1.Hirosaki Univ., 2.Tohoku Univ.)