[14a-A26-1~10] 6.2 Carbon-based thin films

[14a-A26-10] Effects of Si- and N-Incorporation on the Properties of DLC Films by Plasma-Enhanced Chemical Vapor Deposition Using H₂ as a Dilution Gas

〇Kazuki Nakamura¹, Ohashi Haruka¹, Yokoyama Tai², Tajima Keiichiro², Endoh Norihumi², Suemitsu Maki², Enta Yoshiharu¹, Nakazawa Hideki¹ (1.Hirosaki Univ., 2.Tohoku Univ.)

Keywords:diamond-like carbon, plasma-enhanced chemical vapor deposition