Mai Saito

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Speaker, Author, Co-Author

Wed. Sep 14, 2016 1:30 PM - 5:45 PM A31 (302A)

Oral presentation
| 6 Thin Films and Surfaces
| 6.3 Oxide electronics

[14p-A31-1~16] 6.3 Oxide electronics

1:45 PM - 2:00 PM

△ [14p-A31-2] High rate deposition of n-type and p-type SnOx films deposited by reactive sputtering with impedance control systems

〇Takumi Sugane¹, Junjun Jia¹, Shinichi Nakamura¹, Gloess Daniel², Yuzo Shigesato¹ (1.Aoyama-Gakuin Univ., 2.FEP)

Thu. Sep 15, 2016 9:00 AM - 12:15 PM A31 (302A)

Oral presentation
| 6 Thin Films and Surfaces
| 6.3 Oxide electronics

[15a-A31-1~13] 6.3 Oxide electronics

9:15 AM - 9:30 AM

[15a-A31-2] Niobium Oxide film deposited by reactive sputtering with plasma emission feedback system

〇Mai Saito¹, Junjun Jia¹, Shinichi Nakamura¹, Gloess Daniel², Yuzo Shigesato¹ (1.Aoyama-Gakuin Univ., 2.FEP)